系統鍍膜 MBE PVD
The all new M Series range of platforms are based on our proven MBE system technology offering a very low and stable UHV performance for MBE researchers utilising a conflat flange platform. The M Series range regardless of size and complexity use the same proven technology whilst offering optimised characteristics depending on research specialisation and budget. All M Series platforms are controlled using our latest software control platform TITANIUM 10.
The all new Q Series range of platforms are based on our proven QPrep system technology offering UHV performance for PVD researchers utalising a conflat flange chamber. This allows true UHV to be achieved while allowing excellent chamber access through the large top-flange. The Q500 range all use the same proven technology whilst offering optimised characteristics depending on research specialisation and budget.
The P600 MBE R&D version is a versatile research MBE system with 12 ports for effusion cells or other sources.
The P600 can be equipped with a manually operated linear wafer transfer system or a fully automatic circular central distribution chamber (CDC) transfer system.
The HFS Probe systems are based upon the temperature control technology used in the THMS600 heating and freezing stages. The dynamic heating and cooling performance ensures that many electrical component temperature control applications are covered.
The PLD 500 is an advanced UHV pulsed laser deposition system for epitaxial growth of oxide materials. The system is available in two configurations – target facing up or target facing down.